Technology: Nano-scale contact-mode lithography
Inprentus manufactures blazed, x-ray diffraction gratings using a new nano-scale contact mode lithography technique that can scribe thousands of lines per millimeter, providing the ultra-accuracy required for diffraction gratings used in x-ray and UV experiments at synchrotron facilities and scientific research institutions. This advanced technique, commercialized by Inprentus, utilizes a mechanical nano-scale scribing process that creates high-precision patterning of surfaces. Inprentus can scribe grating lines with blaze angles below 1 degree with an accuracy of 0.1 degree or better, without the need for ion-milling or other post-processing. Novel interferometry techniques developed at Inprentus allow for grating lines to be position with accuracy better than 20 nm over distances of 10 cm or larger. Using this technology, Inprentus creates gratings with resolving power up to 30,000, unprecedented for mechanically ruled diffraction gratings. Inprentus diffraction gratings are a core component of synchrotron spectrometry instrumentation, allowing scientsts to discover and characterize new material properties in life science, engineering and physics research.
Mechanically Ruled Blazed Diffraction Gratings
Inprentus designs, manufactures and sells mechanically ruled blazed diffraction gratings for x-ray and EUV applications. Inprentus gratings are used in synchrotron, free electron laser, and high-powered laser applications that require chirped pulsed amplification, as well as a variety of spectrometer and monochromator applications.
VLS - Variable Line Spaced gratings
Ruling on curved substrates – concave, convex, toroidal
Resolving power above 100,000
High damage threshold
Dimensions up to 500 x 200mm
Line densities from 50 to 6000 l/mm
Gold (Au) coated ruling surface with silicon or fused silica substrates
Simulation services and grating design optimization services