Inprentus Receives Entrepreneurial Excellence Award Recognizing it as a Top New Venture in the State of Illinois

Inprentus Receives Entrepreneurial Excellence Award Recognizing it as a Top New Venture in the State of Illinois Press Release

Inprentus Inc. has been recognized as a top innovator with its X-ray diffraction grating products, which are used in synchrotron radiation facilities around the world, and are used for a variety of scientific and commercial applications by many Fortune 500 companies, academic institutions and government laboratories.

Champaign, IL, USA, January 25th, 2016: Inprentus was awarded the Entrepreneurial Excellence New Venture Award by the Champaign County Economic Development Corporation at the 11th Annual Innovation Celebration event. The award recognizes a business formed in the last three years, and demonstrates a commitment to continuing success through entrepreneurial talent, creativity and energy that has shown evidence of growing business success.

The team at Inprentus thanks the Champaign County Economic Development Corporation for this important recognition. In just a few years time, the talented team at Inprentus has worked tirelessly to create a breakthrough technology based on the innovations of Prof. Peter Abbamonte of the University of Illinois. Inprentus technology is in demand around the world and we see a bright future ahead,” said Ron van Os, CEO, Inprentus.

 

Awards event Jan 2016

 

Inprentus Inc.

Inprentus designs, manufactures and sells X-ray diffraction gratings for synchrotron radiation facilities which are used for a variety of scientific and commercial applications by many Fortune 500 companies, academic institutions and government laboratories around the world. Inprentus was founded in June 2012 by University of Illinois Urbana-Champaign physics professor Peter Abbamonte to commercialize an innovative, dual-atomic microscope scribing technology, which is a technique for carrying out nano-scale lithography via mechanical deformation of metallic surfaces. This technology is a general purpose approach to high-precision patterning of surfaces, and is particularly suited to x-ray and EUV diffractive optics in which features must be shaped with 0.1 degree angular precision and positioned with nanometer precision over distances of tens of centimeters.